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SeNaTe

Seven Nanometer Technology

Total Cost €

EC-Contrib. €

Partnership

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Outcomes and
results

SeNaTe project word cloud

Explore the words cloud of the SeNaTe project. It provides you a very rough idea of what is the project "SeNaTe" about.

thematically fast 2d prototyping 12nm ic 1d moore eniac first semiconductor 450mm n7 7nm scanner ecsel electronic accuracy platform infrastructure patterning innovative collaboratively electrical options immersion architecture center technologies planarization cmos chain line 3d ket modules precision mask lithography ju qualified demonstration materials imec stakeholders holistic subsequent masp integration itrs performed 300mm solutions etch 10nm appropriate module remaining relates last metrology comprising pilot specification validation euv platforms discovery brings senate deposition lithographic nano clean performance device roadmap geometries volume connected structuring full introduction resolution nodes manufacturing industry interaction

Project "SeNaTe" data sheet

The following table provides information about the project.

Coordinator	ASML NETHERLANDS B.V. Organization address address: DE RUN 6501 city: VELDHOVEN postcode: 5504DR website: www.asml.com contact info title: n.a. name: n.a. surname: n.a. function: n.a. email: n.a. telephone: n.a. fax: n.a.
Coordinator Country	Netherlands [NL]
Total cost	177˙731˙624 €
EC max contribution	31˙816˙386 € (18%)
Programme	1. H2020-EU.2.1.1.7. (ECSEL)
Code Call	ECSEL-2014-2
Funding Scheme	ECSEL-IA
Starting year	2015
Duration (year-month-day)	from 2015-04-01 to 2018-03-31

Partnership

Take a look of project's partnership.

#	participants	country	role	EC contrib. [€]
1	ASML NETHERLANDS B.V. ASML NETHERLANDS B.V. Organization address address: DE RUN 6501 city: VELDHOVEN postcode: 5504DR website: www.asml.com contact info title: n.a. name: n.a. surname: n.a. function: n.a. email: n.a. telephone: n.a. fax: n.a.	NL (VELDHOVEN)	coordinator	8˙557˙804.00
2	INTERUNIVERSITAIR MICRO-ELECTRONICA CENTRUM INTERUNIVERSITAIR MICRO-ELECTRONICA CENTRUM Organization address address: KAPELDREEF 75 city: LEUVEN postcode: 3001 website: www.imec.be contact info title: n.a. name: n.a. surname: n.a. function: n.a. email: n.a. telephone: n.a. fax: n.a.	BE (LEUVEN)	participant	7˙210˙212.00
3	CARL ZEISS SMT GMBH CARL ZEISS SMT GMBH Organization address address: RUDOLF EBER STRASSE 2 city: OBERKOCHEN postcode: 73447 website: n.a. contact info title: n.a. name: n.a. surname: n.a. function: n.a. email: n.a. telephone: n.a. fax: n.a.	DE (OBERKOCHEN)	participant	2˙357˙990.00
4	NEDERLANDSE ORGANISATIE VOOR TOEGEPAST NATUURWETENSCHAPPELIJK ONDERZOEK TNO NEDERLANDSE ORGANISATIE VOOR TOEGEPAST NATUURWETENSCHAPPELIJK ONDERZOEK TNO Organization address address: ANNA VAN BUERENPLEIN 1 city: DEN HAAG postcode: 2595 DA website: www.tno.nl contact info title: n.a. name: n.a. surname: n.a. function: n.a. email: n.a. telephone: n.a. fax: n.a.	NL (DEN HAAG)	participant	1˙151˙729.00
5	NOVA MEASURING INSTRUMENTS LTD NOVA MEASURING INSTRUMENTS LTD Organization address address: WEIZMANN SCIENCE PARK BUILDING 22 city: REHOVOT postcode: 76100 website: www.nova.co.il contact info title: n.a. name: n.a. surname: n.a. function: n.a. email: n.a. telephone: n.a. fax: n.a.	IL (REHOVOT)	participant	1˙075˙348.00
6	APPLIED MATERIALS ISRAEL LTD APPLIED MATERIALS ISRAEL LTD Organization address address: OPPENHEIMER STREET 9 city: REHOVOT postcode: 76705 website: n.a. contact info title: n.a. name: n.a. surname: n.a. function: n.a. email: n.a. telephone: n.a. fax: n.a.	IL (REHOVOT)	participant	940˙967.00
7	INSTITUT FUER MIKROELEKTRONIK STUTTGART INSTITUT FUER MIKROELEKTRONIK STUTTGART Organization address address: ALLMANDRING STRASSE 30A city: STUTTGART postcode: 70569 website: n.a. contact info title: n.a. name: n.a. surname: n.a. function: n.a. email: n.a. telephone: n.a. fax: n.a.	DE (STUTTGART)	participant	845˙982.00
8	FEI ELECTRON OPTICS BV FEI ELECTRON OPTICS BV Organization address address: ACHTSEWEG NOORD GEBOUW AAE 5 city: EINDHOVEN postcode: 5651 GG website: www.fei.com contact info title: n.a. name: n.a. surname: n.a. function: n.a. email: n.a. telephone: n.a. fax: n.a.	NL (EINDHOVEN)	participant	787˙475.00
9	ICT Integrated Circuit Testing GmbH ICT Integrated Circuit Testing GmbH Organization address address: Ammerthalstrasse 20 city: Heimstetten postcode: 85551 website: n.a. contact info title: n.a. name: n.a. surname: n.a. function: n.a. email: n.a. telephone: n.a. fax: n.a.	DE (Heimstetten)	participant	765˙000.00
10	BRUKER JV ISRAEL LTD BRUKER JV ISRAEL LTD Organization address address: 6 HAMECHKAR STREET RAMAT GAVRIEL INDUSTRIAL ZONE city: MIGDAL HAEMEK postcode: 2306990 website: n.a. contact info title: n.a. name: n.a. surname: n.a. function: n.a. email: n.a. telephone: n.a. fax: n.a.	IL (MIGDAL HAEMEK)	participant	695˙236.00
11	FRAUNHOFER GESELLSCHAFT ZUR FOERDERUNG DER ANGEWANDTEN FORSCHUNG E.V. FRAUNHOFER GESELLSCHAFT ZUR FOERDERUNG DER ANGEWANDTEN FORSCHUNG E.V. Organization address address: HANSASTRASSE 27C city: MUNCHEN postcode: 80686 website: www.fraunhofer.de contact info title: n.a. name: n.a. surname: n.a. function: n.a. email: n.a. telephone: n.a. fax: n.a.	DE (MUNCHEN)	participant	676˙624.00
12	UNIVERSITEIT TWENTE UNIVERSITEIT TWENTE Organization address address: DRIENERLOLAAN 5 city: ENSCHEDE postcode: 7522 NB website: www.utwente.nl contact info title: n.a. name: n.a. surname: n.a. function: n.a. email: n.a. telephone: n.a. fax: n.a.	NL (ENSCHEDE)	participant	575˙000.00
13	KLA-TENCOR CORPORATION (ISRAEL) KLA-TENCOR CORPORATION (ISRAEL) Organization address address: HATIKSHORET ST. city: MIGDAL HAEMEK postcode: 23100 website: n.a. contact info title: n.a. name: n.a. surname: n.a. function: n.a. email: n.a. telephone: n.a. fax: n.a.	IL (MIGDAL HAEMEK)	participant	539˙676.00
14	LAM RESEARCH AG LAM RESEARCH AG Organization address address: SEZ-STRASSE 1 city: VILLACH postcode: 9500 website: n.a. contact info title: n.a. name: n.a. surname: n.a. function: n.a. email: n.a. telephone: n.a. fax: n.a.	AT (VILLACH)	participant	528˙653.00
15	APPLIED MATERIALS BELGIUM APPLIED MATERIALS BELGIUM Organization address address: KAPELDREEF 75 Bus C1 city: LEUVEN postcode: 3001 website: n.a. contact info title: n.a. name: n.a. surname: n.a. function: n.a. email: n.a. telephone: n.a. fax: n.a.	BE (LEUVEN)	participant	517˙968.00
16	ASM BELGIUM NV ASM BELGIUM NV Organization address address: KAPELDREEF 75 city: HEVERLEE postcode: 3001 website: n.a. contact info title: n.a. name: n.a. surname: n.a. function: n.a. email: n.a. telephone: n.a. fax: n.a.	BE (HEVERLEE)	participant	446˙245.00
17	LAM RESEARCH BELGIUM LAM RESEARCH BELGIUM Organization address address: KAPELDREEF 75 city: LEUVEN postcode: 3001 website: n.a. contact info title: n.a. name: n.a. surname: n.a. function: n.a. email: n.a. telephone: n.a. fax: n.a.	BE (LEUVEN)	participant	445˙140.00
18	VDL ENABLING TECHNOLOGIES GROUP BV VDL ENABLING TECHNOLOGIES GROUP BV Organization address address: HOEVENWEG 1 city: EINDHOVEN postcode: 5652 AW website: n.a. contact info title: n.a. name: n.a. surname: n.a. function: n.a. email: n.a. telephone: n.a. fax: n.a.	NL (EINDHOVEN)	participant	416˙812.00
19	NANOMOTION LTD NANOMOTION LTD Organization address address: MORDOT HACARMEL INDUSTRIAL PARK 3 HAYETSIRA ST city: Yokneam postcode: 20692 website: n.a. contact info title: n.a. name: n.a. surname: n.a. function: n.a. email: n.a. telephone: n.a. fax: n.a.	IL (Yokneam)	participant	389˙314.00
20	ADVANCED MASK TECHNOLOGY CENTER GMBH & CO KG ADVANCED MASK TECHNOLOGY CENTER GMBH & CO KG Organization address address: RAHNITZER ALLEE 9 city: DRESDEN postcode: 1109 website: www.amtc-dresden.com contact info title: n.a. name: n.a. surname: n.a. function: n.a. email: n.a. telephone: n.a. fax: n.a.	DE (DRESDEN)	participant	382˙500.00
21	JENOPTIK OPTICAL SYSTEMS GMBH JENOPTIK OPTICAL SYSTEMS GMBH Organization address address: GOSCHWITZER STRASSE 25 city: JENA postcode: 7745 website: n.a. contact info title: n.a. name: n.a. surname: n.a. function: n.a. email: n.a. telephone: n.a. fax: n.a.	DE (JENA)	participant	346˙071.00
22	COVENTOR SARL COVENTOR SARL Organization address address: AVENUE DU QUEBEC 3 city: VILLEBON SUR YVETTE postcode: 91140 website: www.coventor.com contact info title: n.a. name: n.a. surname: n.a. function: n.a. email: n.a. telephone: n.a. fax: n.a.	FR (VILLEBON SUR YVETTE)	participant	306˙038.00
23	DEMCON ADVANCED MECHATRONICS BV DEMCON ADVANCED MECHATRONICS BV Organization address address: INSTITUTENWEG 25 city: ENSCHEDE postcode: 7521 PH website: www.demcon.nl contact info title: n.a. name: n.a. surname: n.a. function: n.a. email: n.a. telephone: n.a. fax: n.a.	NL (ENSCHEDE)	participant	236˙135.00
24	RI RESEARCH INSTRUMENTS GMBH RI RESEARCH INSTRUMENTS GMBH Organization address address: FRIEDRICH EBERT STRASSE 1 city: BERGISCH GLADBACH postcode: 51429 website: n.a. contact info title: n.a. name: n.a. surname: n.a. function: n.a. email: n.a. telephone: n.a. fax: n.a.	DE (BERGISCH GLADBACH)	participant	217˙425.00
25	FABMATICS GMBH FABMATICS GMBH Organization address address: ZUR STEINHOEHE 1 city: DRESDEN postcode: 1109 website: www.hap-dresden.de; www.hap.eu contact info title: n.a. name: n.a. surname: n.a. function: n.a. email: n.a. telephone: n.a. fax: n.a.	DE (DRESDEN)	participant	195˙136.00
26	KLA-Tencor MIE GmbH KLA-Tencor MIE GmbH Organization address address: Kubacher Weg 4 city: Weilburg postcode: 35781 website: n.a. contact info title: n.a. name: n.a. surname: n.a. function: n.a. email: n.a. telephone: n.a. fax: n.a.	DE (Weilburg)	participant	182˙704.00
27	SEMILAB FELVEZETO FIZIKAI LABORATORIUM RESZVENYTARSASAG SEMILAB FELVEZETO FIZIKAI LABORATORIUM RESZVENYTARSASAG Organization address address: PRIELLE KORNELIA UTCA 4/A. city: BUDAPEST postcode: 1117 website: www.semilab.com contact info title: n.a. name: n.a. surname: n.a. function: n.a. email: n.a. telephone: n.a. fax: n.a.	HU (BUDAPEST)	participant	127˙380.00
28	FEI CZECH REPUBLIC SRO FEI CZECH REPUBLIC SRO Organization address address: PECHA 1282/12 city: BRNO postcode: 627 00 website: n.a. contact info title: n.a. name: n.a. surname: n.a. function: n.a. email: n.a. telephone: n.a. fax: n.a.	CZ (BRNO)	participant	121˙988.00
29	ASELTA NANOGRAPHICS SA ASELTA NANOGRAPHICS SA Organization address address: PARVIS LOUIS NEEL 7 city: GRENOBLE postcode: 38000 website: n.a. contact info title: n.a. name: n.a. surname: n.a. function: n.a. email: n.a. telephone: n.a. fax: n.a.	FR (GRENOBLE)	participant	118˙796.00
30	PFEIFFER VACUUM PFEIFFER VACUUM Organization address address: 98 AVENUE DE BROGNY city: ANNECY postcode: 74000 website: www.adixen.com contact info title: n.a. name: n.a. surname: n.a. function: n.a. email: n.a. telephone: n.a. fax: n.a.	FR (ANNECY)	participant	117˙344.00
31	SOITEC SA SOITEC SA Organization address address: CHEMIN DES FRANQUES - PARC TECHNOLOGIQUE DES FONTAINES city: BERNIN postcode: 38190 website: www.soitec.com contact info title: n.a. name: n.a. surname: n.a. function: n.a. email: n.a. telephone: n.a. fax: n.a.	FR (BERNIN)	participant	116˙553.00
32	PHYSIKALISCH-TECHNISCHE BUNDESANSTALT PHYSIKALISCH-TECHNISCHE BUNDESANSTALT Organization address address: Bundesallee 100 city: BRAUNSCHWEIG postcode: 38116 website: www.ptb.de contact info title: n.a. name: n.a. surname: n.a. function: n.a. email: n.a. telephone: n.a. fax: n.a.	DE (BRAUNSCHWEIG)	participant	113˙692.00
33	SUSS MicroTec Photomask Equipment GmbH & Co. KG SUSS MicroTec Photomask Equipment GmbH & Co. KG Organization address address: Ferdinand-von-Steinbeis-Ring 10 city: Sternenfels postcode: 75447 website: n.a. contact info title: n.a. name: n.a. surname: n.a. function: n.a. email: n.a. telephone: n.a. fax: n.a.	DE (Sternenfels)	participant	102˙451.00
34	RECIF TECHNOLOGIES RECIF TECHNOLOGIES Organization address address: rue des briquetiers 9 city: Blagnac postcode: 31700 website: www.reciftech.com contact info title: n.a. name: n.a. surname: n.a. function: n.a. email: n.a. telephone: n.a. fax: n.a.	FR (Blagnac)	participant	83˙872.00
35	ASYS AUTOMATIC SYSTEMS GMBH & CO KG ASYS AUTOMATIC SYSTEMS GMBH & CO KG Organization address address: GRAFENBERGWEG 20 city: SCHORNDORF postcode: 73614 website: n.a. contact info title: n.a. name: n.a. surname: n.a. function: n.a. email: n.a. telephone: n.a. fax: n.a.	DE (SCHORNDORF)	participant	81˙421.00
36	ECP ECP Organization address address: RUE LOUIS LEPINE 395 LE MILLENAIRE city: MONTPELLIER postcode: 34000 website: n.a. contact info title: n.a. name: n.a. surname: n.a. function: n.a. email: n.a. telephone: n.a. fax: n.a.	FR (MONTPELLIER)	participant	30˙187.00
37	ASM EUROPE BV ASM EUROPE BV Organization address address: VERSTERKERSTRAAT 8 city: ALMERE postcode: 1322 AP website: n.a. contact info title: n.a. name: n.a. surname: n.a. function: n.a. email: n.a. telephone: n.a. fax: n.a.	NL (ALMERE)	participant	10˙928.00
38	BROOKS CCS GMBH BROOKS CCS GMBH Organization address address: Im Wiesengrund 17 city: Radolfzell postcode: 78315 website: n.a. contact info title: n.a. name: n.a. surname: n.a. function: n.a. email: n.a. telephone: n.a. fax: n.a.	DE (Radolfzell)	participant	2˙577.00
39	ASM EUROPE BV ASM EUROPE BV Organization address address: VERSTERKERSTRAAT 8 city: ALMERE postcode: 1322 AP website: www.asm.com contact info title: n.a. name: n.a. surname: n.a. function: n.a. email: n.a. telephone: n.a. fax: n.a.	NL (ALMERE)	participant	0.00
40	HERAEUS QUARZGLAS GMBH & CO KG HERAEUS QUARZGLAS GMBH & CO KG Organization address address: QUARZSTRASSE 8 city: HANAU postcode: 63450 website: n.a. contact info title: n.a. name: n.a. surname: n.a. function: n.a. email: n.a. telephone: n.a. fax: n.a.	DE (HANAU)	participant	0.00
41	INTEL ELECTRONICS LTD INTEL ELECTRONICS LTD Organization address address: HAAVATS STR. 11 city: KIRYAT GAT postcode: 82109 website: n.a. contact info title: n.a. name: n.a. surname: n.a. function: n.a. email: n.a. telephone: n.a. fax: n.a.	IL (KIRYAT GAT)	participant	0.00

Map

Project objective

The SeNaTe project is the next in a chain of thematically connected ENIAC JU KET pilot line projects which are associated with 450mm/300mm development for the 12nm and 10nm technology nodes. The main objective is the demonstration of the 7nm IC technology integration in line with the industry needs and the ITRS roadmap on real devices in the Advanced Patterning Center at imec using innovative device architecture and comprising demonstration of a lithographic platform for EUV and immersion technology, advanced process and holistic metrology platforms, new materials and mask infrastructure. A lithography scanner will be developed based on EUV technology to achieve the 7nm module patterning specification. Metrology platforms need to be qualified for N7’s 1D, 2D and 3D geometries with the appropriate precision and accuracy. For the 7nm technology modules a large number of new materials will need to be introduced. The introduction of these new materials brings challenges for all involved processes and the related equipment set. Next to new deposition processes also the interaction of the involved materials with subsequent etch, clean and planarization steps will be studied. Major European stakeholders in EUV mask development will collaboratively work together on a number of key remaining EUV mask issues. The first two years of the project will be dedicated to find the best options for patterning, device performance, and integration. In the last year a full N7 integration with electrical measurements will be performed to enable the validation of the 7nm process options for a High Volume Manufacturing. The SeNaTe project relates to the ECSEL work program topic Process technologies – More Moore. It addresses and targets as set out in the MASP at the discovery of new Semiconductor Process, Equipment and Materials solutions for advanced CMOS processes that enable the nano-structuring of electronic devices with 7nm resolution in high-volume manufacturing and fast prototyping.

Publications

List of publications.
year	authors and title	journal	last update
2017	S. Guissi, W. F. Clark, A. Junker, J. Ervin, K. Greiner, D. Fried, B. Briggs, K. Devriendt, F. Sebaai, A. Charley, C. J. Wilson, J. Boemmels, Z. TÅ‘kei Modeling of Tone Inversion Process Flow for N5 Interconnect to Characterize Block Tip to Tip published pages: , ISSN: , DOI:	INTERNATIONAL INTERCONNECT TECHNOLOGY CONFERENCE 2017	2019-09-04
2015	F. Molkenboer Vacuum Architecture of an EUV exposure system published pages: Paper VT-WeM11, ISSN: , DOI:	AVS Proceedings 62	2019-09-04
2015	Lukas Bahrenberg, Stefan Herbert, Jenny Tempeler, Aleksey Maryasov, Oskar Hofmann, Serhiy Danylyuk, Rainer Lebert, Peter Loosen, Larissa Juschkin Analysis of distinct scattering of extreme ultraviolet phase and amplitude multilayer defects with an actinic dark-field microscope published pages: 942229, ISSN: , DOI: 10.1117/12.2085929	Extreme Ultraviolet (EUV) Lithography VI	2019-09-04
2015	Sushil Sakhare, Darko Trivkovic, Tom Mountsier, Min-Soo Kim, Dan Mocuta, Julien Ryckaert, Abdelkarim Mercha, Diederik Verkest, Aaron Thean, Mircea Dusa Layout optimization and trade-off between 193i and EUV-based patterning for SRAM cells to improve performance and process variability at 7nm technology node published pages: 94270O, ISSN: , DOI: 10.1117/12.2086100	Design-Process-Technology Co-optimization for Manufacturability IX	2019-09-04
2016	Ivan Pollentier, Johannes Vanpaemel, Jae Uk Lee, Christoph Adelmann, Houman Zahedmanesh, Cedric Huyghebaert, Emily E. Gallagher EUV lithography imaging using novel pellicle membranes published pages: 977620, ISSN: , DOI: 10.1117/12.2220031	Extreme Ultraviolet (EUV) Lithography VII	2019-09-04
2017	Mertens, H.; Ritzenthaler, R.; Pena, V.; Santoro, G.; Kenis, K.; Schulze, A.; Dentoni Litta, E.; Chew, S.; Devriendt, K.; Chiarella, T.; Demuynck, S.; Yakimets, D.; Jang, D.; Spessot, A.; Eneman, G.; Dangol, A.; Lagrain, P.; Bender, H.; Sun, S.; Korolik, M.; Kioussis, D.; Kim, M.; Bu, K.; Chen, S.; Cogorno, M.; Devrajan, J.; Machillot, J.; Yoshida, N.; Kim, N.; Barla, K.; Mocuta, D. and Horiguchi, N. Vertically stacked gate-all-around Si nanowire transistors: key process optimizations and ring oscillator demonstration published pages: , ISSN: , DOI:		2019-09-04
2016	Edwin te Sligte, Norbert Koster, Freek Molkenboer, Alex Deutz EBL2, a flexible, controlled EUV exposure and surface analysis facility published pages: 99840R, ISSN: , DOI: 10.1117/12.2240302	Photomask Japan 2016: XXIII Symposium on Photomask and Next-Generation Lithography Mask Technology	2019-09-04
2016	Jae Uk Lee, Johannes Vanpaemel, Ivan Pollentier, Christoph Adelmann, Houman Zahedmanesh, Cedric Huyghebaert, Marina Timmermans, Michael De Volder, Emily Gallagher Introducing the EUV CNT pellicle published pages: 99850C, ISSN: , DOI: 10.1117/12.2243019	Photomask Technology 2016 99850C (25 October 2016)	2019-09-04
2017	Norbert Koster, Edwin te Sligte, Alex Deutz, Freek Molkenboer, Pim Muilwijk, Peter van der Walle, Wouter Mulckhuyse, Bjorn Nijland, Peter Kerkhof, Michel van Putten First light and results on EBL2 published pages: 104540O, ISSN: , DOI: 10.1117/12.2279025	Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology	2019-09-04
2016	V. Soltwisch, A. Haase, J. Wernecke, J. Probst, M. Schoengen, S. Burger, M. Krumrey, F. Scholze Correlated diffuse x-ray scattering from periodically nanostructured surfaces published pages: , ISSN: 2469-9950, DOI: 10.1103/PhysRevB.94.035419	Physical Review B 94/3	2019-09-04
2015	Anton Haase, Victor Soltwisch, Frank Scholze, Stefan Braun Characterization of Mo/Si mirror interface roughness for different Mo layer thickness using resonant diffuse EUV scattering published pages: 962804, ISSN: , DOI: 10.1117/12.2191265	Optical Systems Design 2015: Optical Fabrication, Testing, and Metrology V	2019-09-04
2017	Alberto Pirati, Jan van Schoot, Kars Troost, Rob van Ballegoij, Peter Krabbendam, Judon Stoeldraijer, Erik Loopstra, Jos Benschop, Jo Finders, Hans Meiling, Eelco van Setten, Niclas Mika, Jeannot Dredonx, Uwe Stamm, Bernhard Kneer, Bernd Thuering, Winfried Kaiser, Tilmann Heil, Sascha Migura The future of EUV lithography: enabling Moore\'s Law in the next decade published pages: 101430G, ISSN: , DOI: 10.1117/12.2261079	Extreme Ultraviolet (EUV) Lithography VIII	2019-09-04
2017	F.T. Molkenboer, N.B. Koster, A.F. Deutz, B.A.H. Nijland, P.J. Kerkhof, P.M. Muilwijk, B.W. Oostdijck, J. Westerhout, C.L. Hollemans, W.F.W. Mulckhuyse, M. van Putten, P. van der Walle, A.M. Hoogstrate, J.R.H. Diesveld, A. Abutan Ultra Clean sample transportation in an EUV exposure system published pages: VT-WeM3, ISSN: , DOI:	AVS Proceedings 64	2019-09-04
2015	Emily E. Gallagher, Johannes Vanpaemel, Ivan Pollentier, Houman Zahedmanesh, Christoph Adelmann, Cedric Huyghebaert, Rik Jonckheere, Jae Uk Lee Properties and performance of EUVL pellicle membranes published pages: 96350X, ISSN: , DOI: 10.1117/12.2199076	Photomask Technology 2015	2019-09-04
2015	E. te Sligte EBL2: EUV exposure and surface analysis system published pages: , ISSN: , DOI:	EUVL Symposium 2015	2019-09-04
2016	H. Sadeghian Parallel, high throughput atomic force metrology for EUV masks and wafers published pages: , ISSN: , DOI:	SPIE Advanced Lithography Proceedings 2016	2019-09-04
2017	Mark van de Kerkhof, Hans Jasper, Leon Levasier, Rudy Peeters, Roderik van Es, Jan-Willem Bosker, Alexander Zdravkov, Egbert Lenderink, Fabrizio Evangelista, Par Broman, Bartosz Bilski, Thorsten Last Enabling sub-10nm node lithography: presenting the NXE:3400B EUV scanner published pages: 101430D, ISSN: , DOI: 10.1117/12.2258025	Extreme Ultraviolet (EUV) Lithography VIII	2019-09-04
2016	Efrain Altamirano-SÃ¡nchez, Tao S. Zheng, Anil Gunay Demirkol, Gian F. Lorusso, Toby Hopf, Jean-Christophe Everat IMEC (Belgium), William Clark, Coventor (France); Daniel Sobieski, Fung-Suong Ou, Lam Research Corp. (United States); David Hellin, Lam Research (Belgium) Self-aligned-quadruple-patterning for N7/N5 silicon fins published pages: , ISSN: , DOI:	SPIE Advanced Lithigraphy 2016	2019-09-04
2016	Edwin te Sligte, Norbert Koster, Freek Molkenboer, Peter van der Walle, Pim Muilwijk, Wouter Mulckhuyse, Bastiaan Oostdijck, Christiaan Hollemans, BjÃ¶rn Nijland, Peter Kerkhof, Michel van Putten, AndrÃ© Hoogstrate, Alex Deutz EBL2: high power EUV exposure facility published pages: 998520, ISSN: , DOI: 10.1117/12.2240921	Photomask Technology 2016	2019-09-04
2017	Freek Molkenboer, Norbert Koster, Alfred Abutan, Alex Deutz, Hans Diesveld, Christiaan Hollemans, Andre Hoogstrate, Peter Kerkhof, Pim Muilwijk, Wouter Mulckhuyse, Bjorn Nijland, Bastiaan Oostdijck, Michel van Putten, Edwin te Sligte, Peter van der Walle, Jeroen Westerhout Realisation of a vacuum system for EUV beam line EBL2 published pages: p 18-23, ISSN: 0169-9431, DOI:	NEVAC Blad 55 (3)	2019-09-04
2016	P. Muilwijk Realization of an in-situ Mueller-matrix imaging ellipsometer for the real time observation of surface properties in an ultra-high vacuum EUV facility published pages: \"Paper #4224\", ISSN: , DOI:	AVS Proceedings 63	2019-09-04
2016	F. Molkenboer Realisation of a vacuum system of an EUV exposure system Presentation published pages: \"Paper #3725\", ISSN: , DOI:	AVS Proceedings 63	2019-09-04
2017	Vicky Philipsen, Kim Vu Luong, Laurent Souriau, Eric Hendrickx, Andreas Erdmann, Dongbo Xu, Peter Evanschitzky, Robbert W. E. van de Kruijs, Arash Edrisi, Frank Scholze, Christian Laubis, Mathias Irmscher, Sandra Naasz, Christian Reuter Reducing EUV mask 3D effects by alternative metal absorbers published pages: 1014310, ISSN: , DOI: 10.1117/12.2257929	Extreme Ultraviolet (EUV) Lithography VIII	2019-09-04
2017	Michel van Putten, N.B. Koster, A.F. Deutz, B.A.H. Nijland, P.J. Kerkhof, P.M. Muilwijk, B.W. Oostdijck, J. Westerhout, C.L. Hollemans, E. te Sligte, W.F.W. Mulckhuyse, F.T. Molkenboer, A.M. Hoogstrate, P. van der Walle, J.R.H. Diesveld, A. Abutan EBL2: realization and qualification of an EUV exposure system published pages: VT-TuM11, ISSN: , DOI:	AVS Proceedings 64	2019-09-04
2015	Christian Laubis, Anton Haase, Victor Soltwisch, Frank Scholze Characterization of optical material parameters for EUV Lithography applications at PTB published pages: 96610W, ISSN: , DOI: 10.1117/12.2195009	31st European Mask and Lithography Conference	2019-09-04
2015	Victor Soltwisch, Andreas Fischer, Christian Laubis, Christian Stadelhoff, Frank Scholze, Albrecht Ullrich Polarization resolved measurements with the new EUV ellipsometer of PTB published pages: 942213, ISSN: , DOI: 10.1117/12.2085798	Extreme Ultraviolet (EUV) Lithography VI	2019-09-04
2017	Peter Evanschitzky, Andreas Erdmann Advanced EUV mask and imaging modeling published pages: 1, ISSN: 1932-5150, DOI: 10.1117/1.jmm.16.4.041005	Journal of Micro/Nanolithography, MEMS, and MOEMS 16/04	2019-09-04
2016	Jiangjiang (Jimmy) Gu, Dalong Zhao, Vasanth Allampalli, Daniel Faken, Ken Greiner, David M. Fried Predicting LER and LWR in SAQP with 3D virtual fabrication published pages: 97820N, ISSN: , DOI: 10.1117/12.2218929	Advanced Etch Technology for Nanopatterning V	2019-09-04
2016	Jo Finders, Sander Wuister, Thorsten Last, Gijsbert Rispens, Eleni Psari, Jan Lubkoll, Eelco van Setten, Friso Wittebrood Contrast optimization for 0.33NA EUV lithography published pages: 97761P, ISSN: , DOI: 10.1117/12.2220036	Extreme Ultraviolet (EUV) Lithography VII	2019-09-04
2016	Alberto Pirati, Rudy Peeters, Daniel Smith, Sjoerd Lok, Martijn van Noordenburg, Roderik van Es, Eric Verhoeven, Henk Meijer, Arthur Minnaert, Jan-Willem van der Horst, Hans Meiling, Joerg Mallmann, Christian Wagner, Judon Stoeldraijer, Geert Fisser, Jo Finders, Carmen Zoldesi, Uwe Stamm, Herman Boom, David Brandt, Daniel Brown, Igor Fomenkov, Michael Purvis EUV lithography performance for manufacturing: status and outlook published pages: 97760A, ISSN: , DOI: 10.1117/12.2220423	Extreme Ultraviolet (EUV) Lithography VII	2019-09-04
2016	Philipsen, V.; Luong, V.; Hendrickx, E.; Erdmann, A.; Dongbo, X.; Evanschitzky, P.; van de Kruijs, R.; Edrisi, A.; Scholze, F.; Laubis, C.; Irmscher, M. and Naasz, S. Mitigating EUV mask 3D effects by alternative metal absorbers published pages: , ISSN: , DOI:		2019-09-04
2015	E. te Sligte EBL2, a flexible and controlled EUV exposure and surface analysis system published pages: , ISSN: , DOI:	PTB Workshop 2015	2019-09-04
2016	Luong, V.; Philipsen, V.; Hendrickx, E.; Scholze, F.; van de Kruijs, R.; Edrisi, A.; Wood, O. and Heyns, M. Optimized EUV mask absorber stack for improved imaging by reducing roughness and crystallinity of alternative absorber materials published pages: , ISSN: , DOI:		2019-09-04
2017	Norbert Koster, Edwin te Sligte, Freek Molkenboer, Alex Deutz, Peter van der Walle, Pim Muilwijk, Wouter Mulckhuyse, Bastiaan Oostdijck, Christiaan Hollemans, BjÃ¶rn Nijland, Peter Kerkhof, Michel van Putten, Jeroen Westerhout First light at EBL2 published pages: 101431N, ISSN: , DOI: 10.1117/12.2257997	Extreme Ultraviolet (EUV) Lithography VIII	2019-09-04
2017	Andreas Erdmann, Dongbo Xu, Peter Evanschitzky, Vicky Philipsen, Vu Luong, Eric Hendrickx Characterization and mitigation of 3D mask effects in extreme ultraviolet lithography published pages: , ISSN: 2192-8584, DOI: 10.1515/aot-2017-0019	Advanced Optical Technologies 6/3-4	2019-09-04
2016	Derk Brouns, Aage Bendiksen, Par Broman, Eric Casimiri, Paul Colsters, Peter Delmastro, Dennis de Graaf, Paul Janssen, Mark van de Kerkhof, Ronald Kramer, Matthias Kruizinga, Henk Kuntzel, Frits van der Meulen, David Ockwell, Maria Peter, Daniel Smith, Beatrijs Verbrugge, David van de Weg, Jim Wiley, Noelie Wojewoda, Carmen Zoldesi, Pieter van Zwol NXE pellicle: offering a EUV pellicle solution to the industry published pages: 97761Y, ISSN: , DOI: 10.1117/12.2221909	Extreme Ultraviolet (EUV) Lithography VII	2019-09-04
2016	P. Bussink Sub 20nm particle inspection on EUV mask blanks published pages: 9778-115, ISSN: , DOI:	SPIE Advanced Lithography Proceedings 2016	2019-09-04
2015	Jan van Schoot, Koen van Ingen Schenau, Gerardo Bottiglieri, Kars Troost, John Zimmerman, Sascha Migura, Bernhard Kneer, Jens Timo Neumann, Winfried Kaiser EUV High-NA scanner and mask optimization for sub 8 nm resolution published pages: 963503, ISSN: , DOI: 10.1117/12.2202258	Photomask Technology 2015	2019-09-04

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