COCOON

Conformal coating of nanoporous materials

 Coordinatore UNIVERSITEIT GENT 

Spiacenti, non ci sono informazioni su questo coordinatore. Contattare Fabio per maggiori infomrazioni, grazie.

 Nazionalità Coordinatore Belgium [BE]
 Totale costo 1˙432˙799 €
 EC contributo 1˙432˙799 €
 Programma FP7-IDEAS-ERC
Specific programme: "Ideas" implementing the Seventh Framework Programme of the European Community for research, technological development and demonstration activities (2007 to 2013)
 Code Call ERC-2009-StG
 Funding Scheme ERC-SG
 Anno di inizio 2010
 Periodo (anno-mese-giorno) 2010-01-01   -   2014-12-31

 Partecipanti

# participant  country  role  EC contrib. [€] 
1    UNIVERSITEIT GENT

 Organization address address: SINT PIETERSNIEUWSTRAAT 25
city: GENT
postcode: 9000

contact info
Titolo: Ms.
Nome: Nathalie
Cognome: Vandepitte
Email: send email
Telefono: -2643006
Fax: -2643560

BE (GENT) hostInstitution 1˙432˙800.00
2    UNIVERSITEIT GENT

 Organization address address: SINT PIETERSNIEUWSTRAAT 25
city: GENT
postcode: 9000

contact info
Titolo: Prof.
Nome: Christophe
Cognome: Detavernier
Email: send email
Telefono: -2644331
Fax: -2644973

BE (GENT) hostInstitution 1˙432˙800.00

Mappa


 Word cloud

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deposition    interior    structures    materials    engineering    size    layer    cells    material    porous    atomic    separation    nanoporous    walls    pore    catalysis    ald    molecular    breakthrough    sites    ratios    composition    surface   

 Obiettivo del progetto (Objective)

'CONTEXT - Nanoporous structures are used for application in catalysis, molecular separation, fuel cells, dye sensitized solar cells etc. Given the near molecular size of the porous network, it is extremely challenging to modify the interior surface of the pores after the nanoporous material has been synthesized.

THIS PROPOSAL - Atomic Layer Deposition (ALD) is envisioned as a novel technique for creating catalytically active sites and for controlling the pore size distribution in nanoporous materials. ALD is a self-limited growth method that is characterized by alternating exposure of the growing film to precursor vapours, resulting in the sequential deposition of (sub)monolayers. It provides atomic level control of thickness and composition, and is currently used in micro-electronics to grow films into structures with aspect ratios of up to 100 / 1. We aim to make the fundamental breakthroughs necessary to enable atomic layer deposition to engineer the composition, size and shape of the interior surface of nanoporous materials with aspect ratios in excess of 10,000 / 1.

POTENTIAL IMPACT Achieving these objectives will enable atomic level engineering of the interior surface of any porous material. We plan to focus on three specific applications where our results will have both medium and long term impacts:

- Engineering the composition of pore walls using ALD, e.g. to create catalytic sites (e.g. Al for acid sites, Ti for redox sites, or Pt, Pd or Ni)

- chemical functionalization of the pore walls with atomic level control can result in breakthrough applications in the fields of catalysis and sensors.

- Atomic level control of the size of nanopores through ALD controlling the pore size distribution of molecular sieves can potentially lead to breakthrough applications in molecular separation and filtration.

- Nanocasting replication of a mesoporous template by means of ALD can result in the mass-scale production of nanotubes.'

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