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NanoLAPS

NANOSTRUCTURED LARGE AREA PLASMONIC SYSTEMS DEPOSITED BY GAS FLOW SPUTTERING AND PLASMA-ENHANCED CVD PROCESSES

Total Cost €

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EC-Contrib. €

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Partnership

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Project "NanoLAPS" data sheet

The following table provides information about the project.

Coordinator
FRAUNHOFER GESELLSCHAFT ZUR FOERDERUNG DER ANGEWANDTEN FORSCHUNG E.V. 

Organization address
address: HANSASTRASSE 27C
city: MUNCHEN
postcode: 80686
website: www.fraunhofer.de

contact info
title: n.a.
name: n.a.
surname: n.a.
function: n.a.
email: n.a.
telephone: n.a.
fax: n.a.

 Coordinator Country Germany [DE]
 Project website https://www.researchgate.net/project/NanoLAPS
 Total cost 159˙460 €
 EC max contribution 159˙460 € (100%)
 Programme 1. H2020-EU.1.3.2. (Nurturing excellence by means of cross-border and cross-sector mobility)
 Code Call H2020-MSCA-IF-2014
 Funding Scheme MSCA-IF-EF-ST
 Starting year 2015
 Duration (year-month-day) from 2015-04-01   to  2017-06-29

 Partnership

Take a look of project's partnership.

# participants  country  role  EC contrib. [€] 
1    FRAUNHOFER GESELLSCHAFT ZUR FOERDERUNG DER ANGEWANDTEN FORSCHUNG E.V. DE (MUNCHEN) coordinator 159˙460.00

Map

 Project objective

Nanocomposites made of metallic nanoparticles (e.g. Au, Ag, Cu) embedded in a transparent matrix may display unique optical properties due to plasmonic effects resulting from the interaction of light with particles of nanometric size. This original behavior can be exploited in a wide range of applications including chemical and bio-sensors with extremely high sensitivity, spectroscopy, solar energy harvesting, and nanophotonics.

In this context, Nano-LAPS project aims at the deposition of high purity nanocomposite materials with well controlled plasmonic absorption peak in the visible or infra-red ranges. Objectives are based on the encouraging results of preliminary work realized on this subject at FhG, which establishes a solid starting point for this project. The chosen approach is based on a unique and original deposition method combining gas flow sputtering and Plasma-Enhanced CVD processes. This technology allows coating large area substrates, with the highest purity, for a wide choice of nanoparticles (Au, Ag, Cu, Al, W, and high performance conductive oxides) and matrices (SiOxCy, TiOxCy, plasma polymers).

The host organization senior researchers and management have an established reputation in research on thin films and nanotechnology, and are highly qualified to lead and to support this project, providing the best conditions for its success. Besides, the researcher has proved his capacity in leading and structuring scientific works on thin films coatings and process design. His experience will complement that of the host organization with new and original topics likely to draw scientific attention and open up perspectives for this research work.

 Publications

year authors and title journal last update
List of publications.
2015 H. Nizard, M. Maicu, D. Hecker, D. Gloess, P.Frach, G. Gerlach
Deposition of nanocomposite coatings by gas-phase condensation (GPC) and PE-CVD processes
published pages: P4.12-109, ISSN: , DOI:
Abstract booklet of the 4th Magnetron, Ion processing & Arc Technologies European Conference (MIATEC) & 14th International Symposium on Reactive Sputter Deposition (RSD), Paris, 8-11 Dec. 2015 - Programme Errata & changes 2019-07-23
2016 H. Nizard, M. Maicu, D. Hecker, D. Gloess, P.Frach, G. Gerlach
Nanocomposite coatings deposited by gas-phase condensation (GPC) and PE-CVD processes
published pages: 300, ISSN: , DOI:
Book of abstracts, International Conference on Plasma Surface Engineering, Garmisch-Partenkirchen, Sept. 12-16, 2016 2019-07-23

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The information about "NANOLAPS" are provided by the European Opendata Portal: CORDIS opendata.

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