Opendata, web and dolomites


Atomic layer deposition of two-dimensional transition metal dichalcogenide nanolayers

Total Cost €


EC-Contrib. €






 ALDof 2DTMDs project word cloud

Explore the words cloud of the ALDof 2DTMDs project. It provides you a very rough idea of what is the project "ALDof 2DTMDs" about.

integration    experimental    simulations    fabrication    alloying    heterostructures    transition    ideal    guide    deposition    vast    2d    derivatives    stone    ex    technique    performed    functionalities    pure    provides    transmission    revealing    atomic    characterization    body    tmd    compatible    create    ald    two    layer    opto    tmds    expertise    electron    dichalcogenides    scotch    unusual    surface    synergy    reveal    unexplored    microscopy    excellent    experimentally    tape    spectroscopy    atomistic    industry    building    reveals    plasma    electrical    area    valley    derivates    band    spin    candidates    stepping    metal    synthesized    limitations    luminescence    phenomena    combine    situ    innovative    dependent    largely    made    ultrathin    ultimately    nanoelectronics    multitude    flakes    gap    device    polarization    commercial    synthesis    alloys    gained    pi    systematic    exfoliated    class    background    resolution    physics    chemistry    optical    dimensional    materials    electronic    group    science    theoretical   

Project "ALDof 2DTMDs" data sheet

The following table provides information about the project.


Organization address
address: GROENE LOPER 3
postcode: 5612 AE

contact info
title: n.a.
name: n.a.
surname: n.a.
function: n.a.
email: n.a.
telephone: n.a.
fax: n.a.

 Coordinator Country Netherlands [NL]
 Total cost 1˙968˙708 €
 EC max contribution 1˙968˙708 € (100%)
 Programme 1. H2020-EU.1.1. (EXCELLENT SCIENCE - European Research Council (ERC))
 Code Call ERC-2014-CoG
 Funding Scheme ERC-COG
 Starting year 2015
 Duration (year-month-day) from 2015-08-01   to  2020-07-31


Take a look of project's partnership.

# participants  country  role  EC contrib. [€] 


 Project objective

Two-dimensional transition metal dichalcogenides (2D-TMDs) are an exciting class of new materials. Their ultrathin body, optical band gap and unusual spin and valley polarization physics make them very promising candidates for a vast new range of (opto-)electronic applications. So far, most experimental work on 2D-TMDs has been performed on exfoliated flakes made by the ‘Scotch tape’ technique. The major next challenge is the large-area synthesis of 2D-TMDs by a technique that ultimately can be used for commercial device fabrication. Building upon pure 2D-TMDs, even more functionalities can be gained from 2D-TMD alloys and heterostructures. Theoretical work on these derivates reveals exciting new phenomena, but experimentally this field is largely unexplored due to synthesis technique limitations. The goal of this proposal is to combine atomic layer deposition with plasma chemistry to create a novel surface-controlled, industry-compatible synthesis technique that will make large area 2D-TMDs, 2D-TMD alloys and 2D-TMD heterostructures a reality. This innovative approach will enable systematic layer dependent studies, likely revealing exciting new properties, and provide integration pathways for a multitude of applications. Atomistic simulations will guide the process development and, together with in- and ex-situ analysis, increase the understanding of the surface chemistry involved. State-of-the-art high resolution transmission electron microscopy will be used to study the alloying process and the formation of heterostructures. Luminescence spectroscopy and electrical characterization will reveal the potential of the synthesized materials for (opto)-electronic applications. The synergy between the excellent background of the PI in 2D materials for nanoelectronics and the group’s leading expertise in ALD and plasma science is unique and provides an ideal stepping stone to develop the synthesis of large-area 2D-TMDs and derivatives.


year authors and title journal last update
List of publications.
2018 Akhil Sharma, Marcel A. Verheijen, Longfei Wu, Saurabh Karwal, Vincent Vandalon, Harm C. M. Knoops, Ravi S. Sundaram, Jan P. Hofmann, W. M. M. (Erwin) Kessels, Ageeth A. Bol
Low-temperature plasma-enhanced atomic layer deposition of 2-D MoS 2 : large area, thickness control and tuneable morphology
published pages: 8615-8627, ISSN: 2040-3364, DOI: 10.1039/c8nr02339e
Nanoscale 10/18 2019-06-07
2018 Shashank Balasubramanyam, Akhil Sharma, Vincent Vandalon, Harm C. M. Knoops, Wilhelmus M. M. (Erwin) Kessels, Ageeth A. Bol
Plasma-enhanced atomic layer deposition of tungsten oxide thin films using ( t BuN) 2 (Me 2 N) 2 W and O 2 plasma
published pages: 01B103, ISSN: 0734-2101, DOI: 10.1116/1.4986202
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 36/1 2019-06-07
2018 M. Shirazi, W. M. M. Kessels, A. A. Bol
Initial stage of atomic layer deposition of 2D-MoS 2 on a SiO 2 surface: a DFT study
published pages: 16861-16875, ISSN: 1463-9076, DOI: 10.1039/c8cp00210j
Physical Chemistry Chemical Physics 20/24 2019-04-19
2018 Saravana Balaji Basuvalingam, Bart Macco, Harm C. M. Knoops, Jimmy Melskens, Wilhelmus M. M. (Erwin) Kessels, Ageeth A. Bol
Comparison of thermal and plasma-enhanced atomic layer deposition of niobium oxide thin films
published pages: 41503, ISSN: 0734-2101, DOI: 10.1116/1.5034097
Journal of Vacuum Science & Technology A 36/4 2019-04-19

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