NANO-PROX

Nano-Scale Protective Oxide Films for Semiconductor Applications & Beyond

 Coordinatore Ozyegin University 

 Organization address address: NISANTEPE MAH ORMAN SOK 13
city: ALEMDAG CEKMEKOY ISTANBUL
postcode: 34794

contact info
Titolo: Dr.
Nome: Nilay
Cognome: Papila
Email: send email
Telefono: +90 216 5649568
Fax: +90 216 5649057

 Nazionalità Coordinatore Turkey [TR]
 Totale costo 100˙000 €
 EC contributo 100˙000 €
 Programma FP7-PEOPLE
Specific programme "People" implementing the Seventh Framework Programme of the European Community for research, technological development and demonstration activities (2007 to 2013)
 Code Call FP7-PEOPLE-2009-RG
 Funding Scheme MC-IRG
 Anno di inizio 2010
 Periodo (anno-mese-giorno) 2010-04-01   -   2014-03-31

 Partecipanti

# participant  country  role  EC contrib. [€] 
1    Ozyegin University

 Organization address address: NISANTEPE MAH ORMAN SOK 13
city: ALEMDAG CEKMEKOY ISTANBUL
postcode: 34794

contact info
Titolo: Dr.
Nome: Nilay
Cognome: Papila
Email: send email
Telefono: +90 216 5649568
Fax: +90 216 5649057

TR (ALEMDAG CEKMEKOY ISTANBUL) coordinator 100˙000.00

Mappa


 Word cloud

Esplora la "nuvola delle parole (Word Cloud) per avere un'idea di massima del progetto.

films    barrier    resistance    reactive    moore    self    fundamental    prox    chemical    removal    developments    manufacturing    film    dr    atomic    expertise    interfacial    approaching    sectors    basim    law    transistors    technologies    implants    critical    oxide    nanomaterials    layer    corrosion    years    studied    interface    thin    mechanical    nanofilms    oxides    defect    nano    surface    scientists    cmp    metal    semiconductor    university    limits    inherent    chemicals    ozyegin    permeation    protective    industry   

 Obiettivo del progetto (Objective)

'Conventional demands for development in semiconductor industry are changing as the Moore’s Law approaching to its limits. Continuous decrease in the size of the transistors is coming close to atomic levels creating a fundamental barrier for further process developments as the semiconductor manufacturing is established today . Growth of thin films and inherent stress development within the film and film/substrate interface are critical for multiple phases of microelectronics manufacturing. Particularly, protective oxides of metal films are foreseen to have wide applications as (i) an interfacial layer to improve the adhesion and/or limit penetration of reactive chemicals of a deposited film (ii) as a subtractive layer to achieve selective material removal and (iii) as a nanofilm with inherent self growth limiting capability that could be used for nanoscale electronics manufacturing. Fundamental understanding of the proposed research is expected to be utilized in many other fields such as in biological systems to improve corrosion on bio-implants and, applications in which the interface and thin film properties affect permeation of reactive chemicals such as fusion reactor design or as ferroelectric capacitors where hydrogen permeation detoriates device functionality. Dr. Basim, the Principal Investigator of this study has been actively involved in semiconductor research and development for more than ten years at major semiconductor companies in US. Her expertise is on integration of newly adapted semiconductor processes, defect reduction during manufacturing and chemical and mechanical interactions on thin films. She will initiate her research at Ozyegin University, Mechanical Engineering Department with the support of the IRG funds if awarded. Dr. Basim’s new appointment at Ozyegin University is expected to bring all these expertise and experience to E.U. to promote the ongoing research and development.'

Introduzione (Teaser)

Thin-film technologies based on nanomaterials offer great promise for new devices. Novel technologies enhancing the properties of self-protective metal-oxide thin films are finding application in important market sectors.

Descrizione progetto (Article)

Moore's law, formulated about 50 years ago, states, generally, that the number of transistors on affordable integrated circuits will double approximately every 2 years. That has pretty much held true but, as transistors approach the atomic scale, the law is now approaching its limits, creating a barrier to development within the semiconductor industry.

Thin films made from nanomaterials could provide a solution if their growth and interfacial stresses can be optimised. Protective oxides have several beneficial applications in this realm and were the focus of the EU-funded project 'Nano-scale protective oxide films for semiconductor applications & beyond' (http://faculty.ozyegin.edu.tr/nano-prox/ (NANO-PROX)).

One of the main targeted applications was chemical mechanical planarisation (CMP), a process used by semiconductor manufacturers to 'planarise' a macroscopically flat silicon wafer. Formation and removal of the metal-oxide thin films is critical to controlling defect parameters and resulting topography. NANO-PROX focused on meeting current and future CMP requirements.

After establishing the CMP and surface chemistry facility, scientists first turned to technical developments for applications in the semiconductor industry. Experiments evaluated the effect of oxidiser type and oxidation time on the surface properties of thin films of both tungsten and germanium.

In the second part of the project, researchers implemented CMP to induce self-protective metal-oxide nanofilms on titanium for orthopaedic implants. The team evaluated cell attachment and infection resistance.

Another line of inquiry studied CMP-induced protective films on heating elements to enhance corrosion and lime scale prevention. Finally, scientists studied the use of metal-oxide nanofilms on aluminium for aeroplane bodies and landing gear to enhance corrosion resistance.

The project's overwhelming success can be seen in the variety and number of publications, presentations, patent applications and new projects it spawned. Eight confidentiality agreements were signed with the private sector as well. NANO-PROX has contributed to the increasingly competitive position of the EU in CMP and metal-oxide thin-film technologies. The impact will be felt in sectors from biomedicine to semiconductors to aerospace, providing a potential boost to the EU economy in a period of economic crisis.

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