FEMTOLITHO

Ultrahigh resolution femtosecond laser lithography for applications in life sciences and display technologies

 Coordinatore FOUNDATION FOR RESEARCH AND TECHNOLOGY HELLAS 

 Organization address address: N PLASTIRA STR 100
city: HERAKLION
postcode: 70013

contact info
Titolo: Ms.
Nome: Zinovia
Cognome: Papatheodorou
Email: send email
Telefono: 302810000000
Fax: 302810000000

 Nazionalità Coordinatore Greece [EL]
 Totale costo 216˙952 €
 EC contributo 216˙952 €
 Programma FP7-PEOPLE
Specific programme "People" implementing the Seventh Framework Programme of the European Community for research, technological development and demonstration activities (2007 to 2013)
 Code Call FP7-PEOPLE-2013-IEF
 Funding Scheme MC-IEF
 Anno di inizio 2015
 Periodo (anno-mese-giorno) 2015-02-12   -   2017-10-03

 Partecipanti

# participant  country  role  EC contrib. [€] 
1    FOUNDATION FOR RESEARCH AND TECHNOLOGY HELLAS

 Organization address address: N PLASTIRA STR 100
city: HERAKLION
postcode: 70013

contact info
Titolo: Ms.
Nome: Zinovia
Cognome: Papatheodorou
Email: send email
Telefono: 302810000000
Fax: 302810000000

EL (HERAKLION) coordinator 216˙952.80

Mappa


 Word cloud

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fabrication    sub    structures    resolutions    femtosecond    nm    techniques    resolution    wavelength    liquid    laser    material    lithography   

 Obiettivo del progetto (Objective)

'Femtosecond laser fabrication by nonlinear laser lithography is a powerful method for the fabrication of high resolution, 3D structures. This laser fabrication method allows the creation of 3D structures with sub-diffraction limit resolution, an impossible task for traditional lithographic techniques. In femtosecond laser lithography, starting liquid photoresists are converted into solid phase upon exposure to femtosecond laser light. Standard femtosecond laser lithography enables submicrometer resolution but in many applications it is desirable to achieve even finer resolutions. Applications such as photonic crystals for visible wavelength biosensors, optical-wavelength metamaterials showing negative refraction both require sub 100-nm resolution. Such resolution requirements are not achievable with traditional femtosecond laser fabrication techniques. As the main objective, we will study two different strategies to deplete two photon absorption in the outer region of the laser-material interaction volume to greatly improve the resolution of femtosecond laser lithography. First, we will adapt a method based on stimulated emission depletion, which has shown resolutions of less than 10 nm in microscopy. Secondly, we will seek to optimize quencher diffusion to enhance the resolution possible by femtosecond laser lithography. We will apply these carefully tuned laser-material interactions to form ultrahigh resolution 3D microstructures to study their influence on two elements of crucial importance in life and in science and technology: stem cells and liquid crystal molecules.'

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