SNB09

"Substrate nanopatterning by e-beam lithography to growth ordered arrays of III-Nitride nanodetectors: application to IR detectors, emitters, and new Solar Cells"

 Coordinatore  

 Organization address address: Calle Ramiro de Maeztu 7
city: MADRID
postcode: 28040

contact info
Titolo: Prof.
Nome: Gonzalo
Cognome: León
Email: send email
Telefono: +34 91 3366048
Fax: +34 91 3365974

 Nazionalità Coordinatore Non specificata
 Totale costo 153˙917 €
 EC contributo 0 €
 Programma FP7-PEOPLE
Specific programme "People" implementing the Seventh Framework Programme of the European Community for research, technological development and demonstration activities (2007 to 2013)
 Anno di inizio 2011
 Periodo (anno-mese-giorno) 2011-01-01   -   2012-12-31

 Partecipanti

# participant  country  role  EC contrib. [€] 
1    UNIVERSIDAD POLITECNICA DE MADRID

 Organization address address: Calle Ramiro de Maeztu 7
city: MADRID
postcode: 28040

contact info
Titolo: Prof.
Nome: Gonzalo
Cognome: León
Email: send email
Telefono: +34 91 3366048
Fax: +34 91 3365974

ES (MADRID) coordinator 153˙917.00

Mappa

Leaflet | Map data © OpenStreetMap contributors, CC-BY-SA, Imagery © Mapbox

 Word cloud

Esplora la "nuvola delle parole (Word Cloud) per avere un'idea di massima del progetto.

substrates    arrays    nanomasks    nanorods    gan    subsequent    photonic    beam    light    ordered    crystal   

 Obiettivo del progetto (Objective)

'The overall objective of the proposed project is the development of novel optoelectronic and photonic devices based on ordered arrays of GaN/AIGAN and InGaN/GaN nanorods. The mechanisms of spontaneous nucleation and growth of such nanorods on Si substrates, under specific experimental conditions, have been recently clarified and understood. However, the realization of true devices relies on the achievement of ordered arrays of nanorods by localization of the epitaxial growth on predetermined preferential sites. This challenging issue would be tackled by controlling the growth of such heterostructures by plasma-assisted molecular beam epitaxy (PA-MBE) growth on nanomasks and nanopatterned substrates, and by the subsequent processing of the nanodevices arrays. Ordered growth following a predefined pattern is a critical step to allow subsequent applications. Nanomasks and nanopatterning will be achieved by e-beam lithography and dry etching. Three different devices will be developed as demonstrators, namely, arrays of nanophotodetectors in the IR, white light nanoLEDs, and nanocolumnar Solar Cells. It is worth to remark that all these devices are beyond the state-of-the-art and will benefit from the very high and unique crystal quality of nanorods. Other advantages of such nanostructures are a wide absorption surface and the capability to exploit Photonic Crystal effects for light extraction. The objectives of this project, being very ambitious, are perfectly feasible because all devices are based on the same basic structure of nanorod arrays (building block). The project, aside from very relevant scientific aspects, will offer the young researcher a full training program on technological and complementary issues.'

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