LAMAND

Large Area Molecularly Assembled Nanopatterns for Devices

 Coordinatore UNIVERSITY COLLEGE CORK, NATIONAL UNIVERSITY OF IRELAND, CORK 

 Organization address address: Western Road
city: CORK
postcode: -

contact info
Titolo: Ms.
Nome: Cliodhna
Cognome: Horan
Email: send email
Telefono: +353 21 4904308
Fax: +353 21 4904058

 Nazionalità Coordinatore Ireland [IE]
 Sito del progetto http://www.tyndall.ie/projects/lamand/
 Totale costo 4˙716˙353 €
 EC contributo 3˙463˙000 €
 Programma FP7-NMP
Specific Programme "Cooperation": Nanosciences, Nanotechnologies, Materials and new Production Technologies
 Code Call FP7-NMP-2009-SMALL-3
 Funding Scheme CP-FP
 Anno di inizio 2010
 Periodo (anno-mese-giorno) 2010-07-01   -   2013-06-30

 Partecipanti

# participant  country  role  EC contrib. [€] 
1    UNIVERSITY COLLEGE CORK, NATIONAL UNIVERSITY OF IRELAND, CORK

 Organization address address: Western Road
city: CORK
postcode: -

contact info
Titolo: Ms.
Nome: Cliodhna
Cognome: Horan
Email: send email
Telefono: +353 21 4904308
Fax: +353 21 4904058

IE (CORK) coordinator 603˙634.00
2    UNIVERSITY OF NEWCASTLE UPON TYNE

 Organization address address: Kensington Terrace 6
city: NEWCASTLE UPON TYNE
postcode: NE1 7RU

contact info
Titolo: Ms.
Nome: Deborah
Cognome: Grieves
Email: send email
Telefono: +44 191 222 6131
Fax: +44 191 222 6131

UK (NEWCASTLE UPON TYNE) participant 568˙736.00
3    FUNDACIO INSTITUT CATALA DE NANOCIENCIA I NANOTECNOLOGIA

 Organization address address: CAMPUS DE LA UAB EDIFICI Q ICN2
city: BELLATERRA (BARCELONA)
postcode: 8193

contact info
Titolo: Dr.
Nome: Stella
Cognome: Veciana
Email: send email
Telefono: +34 93 5813840
Fax: +34 93 5814747

ES (BELLATERRA (BARCELONA)) participant 546˙371.00
4    CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE

 Organization address address: Rue Michel -Ange 3
city: PARIS
postcode: 75794

contact info
Titolo: Dr.
Nome: Jean-Xavier
Cognome: Boucherle
Email: send email
Telefono: -76887895
Fax: -76881145

FR (PARIS) participant 373˙384.00
5    PROFACTOR GMBH

 Organization address address: IM STADTGUT A2
city: STEYR-GLEINK
postcode: 4407

contact info
Titolo: Ms.
Nome: Andrea
Cognome: Möslinger
Email: send email
Telefono: +43 7252 885-110
Fax: +43 7252 885-101

AT (STEYR-GLEINK) participant 342˙280.00
6    UNIVERSITY OF IOANNINA

 Organization address address: "LEOFOROS STAVROS S NIARCHOS, PANEPISTIMIOUPOLI IOANNINON"
city: IOANNINA
postcode: 45110

contact info
Titolo: Prof.
Nome: Apostolos
Cognome: Avgeropoulos
Email: send email
Telefono: -33868
Fax: -33514

EL (IOANNINA) participant 333˙514.00
7    SELCUK UNIVERSITESI

 Organization address address: Ziraat Fakultesi - Alaaddin Keykubat Kampusu
city: KONYA
postcode: 42075

contact info
Titolo: Prof.
Nome: Mustafa
Cognome: Ersoz
Email: send email
Telefono: +90 332 223 38 74
Fax: +90 332 241 24 99

TR (KONYA) participant 266˙770.00
8    INTEL RESEARCH AND INNOVATION IRELAND LIMITED

 Organization address address: COLLINSTOWN INDUSTRIAL ESTATE
city: LEIXLIP KILDARE

contact info
Titolo: Mr.
Nome: Bernard
Cognome: Capraro
Email: send email
Telefono: +353 1 606 4228

IE (LEIXLIP KILDARE) participant 251˙501.00
9    KANICHI RESEARCH SERVICES LIMITED

 Organization address address: HOPE ROAD 41 SALE
city: MANCHESTER
postcode: M33 3BF

contact info
Titolo: Prof.
Nome: David
Cognome: Walton
Email: send email
Telefono: +44 1676 532486

UK (MANCHESTER) participant 176˙810.00

Mappa


 Word cloud

Esplora la "nuvola delle parole (Word Cloud) per avere un'idea di massima del progetto.

methodology    significant    nm    bcp    small    microelectronics    assembly    area    pl    circuitry    patterns    competition    device    self    nano    industry    technologies    techniques    afford    companies   

 Obiettivo del progetto (Objective)

'Scaling has driven the microelectronics industry for over 40 years and revolutionised information and communication technologies, health care, education, engineering, etc. Maintaining progress has becomes more challenging and costs of fabrication facilities are rising exponentially. Possible technical/cost solutions centre on development of ‘bottom-up’ techniques to (nano)pattern (the patterns yield device elements) surfaces rather than ‘top-down’ photolithographic (PL) methods that are the major cost of manufacturing circuitry (a single PL system is ~€65 million for next generation devices). Self-assembly is one route to nanopatterns but regularity/alignment over large areas is not consistent with circuit manufacture. Recent work on the self-assembly of block-copolymer (BCP) systems suggests that realisation of patterns of small feature size (~10 nm), at high density (i.e. spaced at ~10 nm), in precisely defined positions (to an accuracy of < 10 nm) on a large area substrate (12”) is possible. This proposal will develop BCP methodology into a set of process techniques for subsequent industrial pre-development. The methodology centres around a combination of bottom-up and top-down techniques to provide the fidelity required to make the methods reproducible and reliable. This proposal would have significant value:- - Enable continued development of devices towards their ultimate performance. - Allow development of advanced circuitry at lower costs. - Prevent monopolisation of the semiconductor industry by 1 or 2 companies that can afford capital costs by opening the market to new competition. - Afford the EU with opportunities to develop profitable companies in materials, process equipment and emerging device technologies. Without a suitable EU-level engagement in this area, competition in the US and Asia will gain a significant technological lead that will minimise the EU’s potential to deliver new and advanced nano-electronic devices.'

Introduzione (Teaser)

European scientists are developing low-cost technology for creating miniaturised electrical circuits. Commercialisation should provide a significant boost to small businesses in the microelectronics sector.

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