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NanoStencil SIGNED

Nanoscale self-assembled epitaxial nucleation controlled by interference lithography

Total Cost €

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EC-Contrib. €

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Partnership

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 NanoStencil project word cloud

Explore the words cloud of the NanoStencil project. It provides you a very rough idea of what is the project "NanoStencil" about.

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Project "NanoStencil" data sheet

The following table provides information about the project.

Coordinator
THE UNIVERSITY OF SHEFFIELD 

Organization address
address: FIRTH COURT WESTERN BANK
city: SHEFFIELD
postcode: S10 2TN
website: www.shef.ac.uk

contact info
title: n.a.
name: n.a.
surname: n.a.
function: n.a.
email: n.a.
telephone: n.a.
fax: n.a.

 Coordinator Country United Kingdom [UK]
 Project website http://nanostencil.eu/
 Total cost 3˙208˙740 €
 EC max contribution 3˙208˙740 € (100%)
 Programme 1. H2020-EU.1.2.1. (FET Open)
 Code Call H2020-FETOPEN-1-2016-2017
 Funding Scheme RIA
 Starting year 2017
 Duration (year-month-day) from 2017-10-01   to  2020-09-30

 Partnership

Take a look of project's partnership.

# participants  country  role  EC contrib. [€] 
1    THE UNIVERSITY OF SHEFFIELD UK (SHEFFIELD) coordinator 919˙720.00
2    TAMPEREEN KORKEAKOULUSAATIO SR FI (TAMPERE) participant 600˙833.00
3    ASOCIACION CENTRO TECNOLOGICO CEIT-IK4 ES (SAN SEBASTIAN) participant 581˙103.00
4    INNOLAS LASER GMBH DE (KRAILLING) participant 560˙207.00
5    UNIVERSITY OF BEDFORDSHIRE UK (LUTON) participant 546˙875.00
6    TTY-SAATIO FI (TAMPERE) participant 0.00

Map

 Project objective

By overcoming all the limitations of conventional top-down nanostructuring, the NanoStencil project seeks to initiate a new process paradigm for the production of dense arrays of identical nanostructures of precise size, shape and composition. It achieves this by combining the simplicity of structuring with light, with the advantages of molecular self-assembly, to provide a single step, cost effective and state of the art capability for next-generation ordered arrays of nanostructures. New methods to achieve such structures are a vital requirement for the exploitation of devices in the quantum regime. In our approach, laser interference patterning is applied by means of ultrashort pulses to material surfaces at the nanostructure formation phase, where it acts to modify local reaction processes providing energetically favourable sites for the nucleation of self-assembly. The approach is based on some established principles and prior art gained within the consortium, but is yet to be demonstrated at the device scale. To achieve in-situ nanostructuring, precision laser interference optics and state of the art pulsed lasers are integrated within materials reactors producing concentrated light patterns with a pitch of fractions of the laser wavelength which then induce local photothermal or photochemical modifications on the growing surface, creating sites for self-assembly. The science objectives of the project are to develop a comprehensive understanding of the absorption of concentrated pulsed light at the nanoscale to understand how this impacts on a growing or reactive surface. The technological objectives are to demonstrate large scale highly ordered arrays of identical nanostructures within four diverse materials systems (InAs quantum dot arrays, patterned SiO2/metallic nanostructures, ZnO nanowires and functional metal oxide nanospots), each of potentially transformative impact within the themes of semiconductor electronic and photonics, sensing and biomaterials.

 Deliverables

List of deliverables.
Interim report on laser interference surface processes Documents, reports 2019-05-16 19:26:23
Laser Prototype 1 Demonstrators, pilots, prototypes 2019-05-16 19:26:23
Website and Project logo established Websites, patent fillings, videos etc. 2019-05-16 19:26:23
Laser interference structuring system implementation plan Documents, reports 2019-05-16 19:26:23

Take a look to the deliverables list in detail:  detailed list of NanoStencil deliverables.

 Publications

year authors and title journal last update
List of publications.
2018 Wang, Yunran; Jin, Chaoyuan; Hopkinson, Mark
Thermodynamic Processes on a Semiconductor Surface during In-Situ Multi-Beam Laser Interference Patterning
published pages: , ISSN: 1751-8776, DOI: 10.5281/zenodo.1477681
IET Optoelectronics 1 2019-10-08

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The information about "NANOSTENCIL" are provided by the European Opendata Portal: CORDIS opendata.

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