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Opendata, web and dolomites

SPRINT SIGNED

Ultra-versatile Structural PRINTing of amorphous and tuned crystalline matter on multiple substrates

Total Cost €

EC-Contrib. €

Partnership

Views

Outcomes and
results

SPRINT project word cloud

Explore the words cloud of the SPRINT project. It provides you a very rough idea of what is the project "SPRINT" about.

tuned architectures nano costly film core broaden photovoltaic micro progress strategic paramount emitting vacuum precise innovation nanotechnology substrates utmost combines photonics crystalline versatile nanoelectronics marketable requirement universal manner performance plethora sprint breaking goes multiple integration light biotechnology limited interfaces ground lower room limitations optoelectronic miniaturization roadmaps deposition inherently unsuitable rates appearance create hampers capacity thin single conceptual materials diodes table radically functional overcome tune atmospheric benefits compatible degree generate absence 3d restrain examples electronic function temperature technologies material dimensions temperatures cells kets significantly prominent crystallinity pressure amorphous plastics sensors

Project "SPRINT" data sheet

The following table provides information about the project.

Coordinator	CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE CNRS Organization address address: RUE MICHEL ANGE 3 city: PARIS postcode: 75794 website: www.cnrs.fr contact info title: n.a. name: n.a. surname: n.a. function: n.a. email: n.a. telephone: n.a. fax: n.a.
Coordinator Country	France [FR]
Total cost	2˙999˙997 €
EC max contribution	2˙999˙997 € (100%)
Programme	1. H2020-EU.1.2.1. (FET Open)
Code Call	H2020-FETOPEN-1-2016-2017
Funding Scheme	RIA
Starting year	2018
Duration (year-month-day)	from 2018-09-01 to 2022-08-31

Partnership

Take a look of project's partnership.

#	participants	country	role	EC contrib. [€]
1	CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE CNRS CENTRE NATIONAL DE LA RECHERCHE SCIENTIFIQUE CNRS Organization address address: RUE MICHEL ANGE 3 city: PARIS postcode: 75794 website: www.cnrs.fr contact info title: n.a. name: n.a. surname: n.a. function: n.a. email: n.a. telephone: n.a. fax: n.a.	FR (PARIS)	coordinator	470˙151.00
2	EIDGENOESSISCHE TECHNISCHE HOCHSCHULE ZUERICH EIDGENOESSISCHE TECHNISCHE HOCHSCHULE ZUERICH Organization address address: Raemistrasse 101 city: ZUERICH postcode: 8092 website: https://www.ethz.ch/de.html contact info title: n.a. name: n.a. surname: n.a. function: n.a. email: n.a. telephone: n.a. fax: n.a.	CH (ZUERICH)	participant	435˙375.00
3	CREATIVE NANO PC CREATIVE NANO PC Organization address address: LEVENTI 4 city: PERISTERI postcode: 12132 website: n.a. contact info title: n.a. name: n.a. surname: n.a. function: n.a. email: n.a. telephone: n.a. fax: n.a.	EL (PERISTERI)	participant	400˙012.00
4	CENTER FOR TECHNOLOGY RESEARCH ANDINNOVATION (CETRI) LTD CENTER FOR TECHNOLOGY RESEARCH ANDINNOVATION (CETRI) LTD Organization address address: 77, John Kennedy Avenue city: Nicosia postcode: 1077 website: www.cetri.net contact info title: n.a. name: n.a. surname: n.a. function: n.a. email: n.a. telephone: n.a. fax: n.a.	CY (Nicosia)	participant	399˙937.00
5	UNIVERSIDADE DO PORTO UNIVERSIDADE DO PORTO Organization address address: PRACA GOMES TEIXEIRA city: PORTO postcode: 4099 002 website: http://www.up.pt contact info title: n.a. name: n.a. surname: n.a. function: n.a. email: n.a. telephone: n.a. fax: n.a.	PT (PORTO)	participant	394˙543.00
6	TECHNISCHE UNIVERSITAET GRAZ TECHNISCHE UNIVERSITAET GRAZ Organization address address: RECHBAUERSTRASSE 12 city: GRAZ postcode: 8010 website: www.tugraz.at contact info title: n.a. name: n.a. surname: n.a. function: n.a. email: n.a. telephone: n.a. fax: n.a.	AT (GRAZ)	participant	300˙452.00
7	AGENCIA ESTATAL CONSEJO SUPERIOR DEINVESTIGACIONES CIENTIFICAS AGENCIA ESTATAL CONSEJO SUPERIOR DEINVESTIGACIONES CIENTIFICAS Organization address address: CALLE SERRANO 117 city: MADRID postcode: 28006 website: http://www.csic.es contact info title: n.a. name: n.a. surname: n.a. function: n.a. email: n.a. telephone: n.a. fax: n.a.	ES (MADRID)	participant	299˙837.00
8	KATHOLIEKE UNIVERSITEIT LEUVEN KATHOLIEKE UNIVERSITEIT LEUVEN Organization address address: OUDE MARKT 13 city: LEUVEN postcode: 3000 website: www.kuleuven.be contact info title: n.a. name: n.a. surname: n.a. function: n.a. email: n.a. telephone: n.a. fax: n.a.	BE (LEUVEN)	participant	299˙687.00

Map

Project objective

Thin film deposition methods are crucial to generate progress in Key Enabling Technologies (KETs) of strategic importance for Europe, including Advanced Materials, Nanotechnology, Micro- and Nanoelectronics, Biotechnology, and Photonics. Devices like photovoltaic cells, light emitting diodes, electronic and optoelectronic micro-/nano-sensors are prominent examples of thin film applications where the precise control of material deposition and its degree of order (crystallinity) are of paramount importance for their performance and function. However, technologies for thin film deposition have very limited capacity to tune the material crystallinity at room temperature and atmospheric pressure, or to create functional 3D architectures in a single and versatile manner. The requirement of high temperatures and vacuum conditions make them inherently costly and unsuitable for deposition on various substrates (e.g. plastics). Moreover, their dimensions are not compatible with miniaturization and integration in table-top interfaces that would broaden their potential use. These limitations restrain the development of ground-breaking functional materials and new-conceptual devices. The absence of a radically new deposition technology hampers innovation and the appearance of new and cost-effective marketable products. Therefore, it is of utmost importance to develop a radically new deposition technology to overcome these limitations, and that is at the core of the SPRINT project. SPRINT will develop a universal deposition technology of amorphous and tuned crystalline matter on multiple substrates, at room temperature and pressure. This technology not only combines the benefits of existing advanced deposition methods, at significantly lower cost and higher deposition rates, but also goes beyond the state-of-the-art in advanced materials development, to open new roadmaps to a plethora of future devices and applications.

Deliverables

List of deliverables.
Project website and logo	Websites, patent fillings, videos etc.	2020-03-19 15:36:25
Interim plans for resultsâ€™ dissemination and exploitation	Documents, reports	2020-03-19 15:36:25

Take a look to the deliverables list in detail: detailed list of SPRINT deliverables.

Publications

List of publications.
year	authors and title	journal	last update
2019	E. Astria, M. Thonhofer, R. Ricco, W. Liang, A. Chemelli, A. Tarzia, K. Alt, C.E. Hagemeyer, J. Rattenberger, H. Schroettner, T. Wrodnigg, H. Amenitsch, D.M. Huang, C.J. Doonan, P. Falcaro Carbohydrates@MOFs published pages: , ISSN: 2051-6347, DOI: 10.1039/c8mh01611a	Materials Horizons	2020-03-19
2019	Semih Sevim, Carlos Franco, Hongjun Liu, HervÃ© Roussel, Laetitia Rapenne, Juan Rubioâ€Zuazo, Xiangâ€Zhong Chen, Salvador PanÃ©, David MuÃ±ozâ€Rojas, Andrew J. deMello, Josep PuigmartÃâ€Luis Inâ€Flow MOF Lithography published pages: 1800666, ISSN: 2365-709X, DOI: 10.1002/admt.201800666	Advanced Materials Technologies 4/6	2020-03-19
2019	D. MuÃ±oz-Rojas, T. Maindron, A. Esteve, F. Piallat, J.C.S. Kools, J.-M. Decams Speeding up the unique assets of atomic layer deposition published pages: 96-120, ISSN: 2468-5194, DOI: 10.1016/j.mtchem.2018.11.013	Materials Today Chemistry 12	2020-03-19
2019	M. de J. Velasquez-Hernandez, R. RiccÃ², F. Carraro, T. Limpoco, M. de las M. Linares-Moreau, E. Leitner, H. Wiltsche, J. Rattenberger, H. Schroettner, P. FrÃ¼hwirt, E. M. Stadler, G. Gescheidt, H. Amenitsch, C. J. Doonan and P. Falcaro Degradation of ZIF-8 in phosphate buffered saline media published pages: , ISSN: 1466-8033, DOI: 10.1039/c9ce00757a	CrystEngComm	2020-03-19

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The information about "SPRINT" are provided by the European Opendata Portal: CORDIS opendata.

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